1700 ℃ vacuum CVD system consists of high temperature tube furnace, high vacuum diffusion pump / molecular pump system, multi-channel high-precision digital mass flow control system, automatic pressure control system and so on. Can make the background vacuum up to 0.001-0.0001Pa mixed gas chemical vapor deposition and diffusion test.
Main functions and features:
1, vacuum system can be chosed according to the requirements to diffusion pump units or molecular pump units;
2, with the pressure control instrument to control the gas pressure to achieve the precise control of negative pressure;
3, digital mass flow control system is composed of multi-channel flowmeter, flow meter and other components to achieve the gas flow of precision measurement and control;
4, each gas pipeline are equipped with high pressure check valve to ensure the safety and reliability of the system.
5, using water-cooled KF fast flange seal, loading and unloading convenient;
6, the pipeline using the world's top Swagelok cutting sleeve of connections, no leakage;
7, over-temperature, over pressure, automatically cut off the heating power and flow meter into the gas, to ensure the safety of equipment and experiments.
The main applications:
Applicable to vacuum coating, nano-thin film material preparation, nanowire growth and other places.
Main technical parameters:
SGL-1700 High Temperature Furnace | Control Mode | Using artificial intelligence adjustment technology, with PID adjustment, self-tuning function, and the preparation of 50 segement cooling program. |
Heating element | Imported 1700 high quality silicon molybdenum rod |
Power supply | AC220V 50Hz / 60Hz; rated power 6kw |
Chamber material | 99 porcelain alumina corundum tube |
Chamber size | Φ60/80/100*/1000mm |
Working temperature | ≤1600℃ |
Max temperature | 1650℃ |
Constant temperature precision | ±1℃ |
Heating speed | ≤10℃/min |
Thermocouple | B thermocouple |
Sealing method | Stainless steel water cooled KF flange extrusion seal |
ZK vacuum system |
| ZK-F | ZK-K |
Vacuum range | 0.1-0.001Pa | 0.1-0.01Pa |
Ultimate vacuum | 5.0*10^-5Pa | 5.0*10^-4Pa |
Product configuration | Two - stage rotary vane vacuum pump + molecular pump | Two - stage rotary vane vacuum pump + diffusion pump |
Cooling mode | Air cooling | Water cooling |
Pumping speed | 110L/S | 100L/S |
Measurement mode | compound vacuum gauge |
Vacuum gauge tube | Resistance gauge + ionization gauge |
ZDC-I pressure control system | Measurement range | 1*10^5~1*10^-1 Pa |
Vacuum | 1*10^3~1*10Pa |
Pressure precision (stable) | ±3% |
Control range | 2.5*10^3~5*10^-1 Pa |
Control accuracy | ± 1% |
HQZ-ⅢMixed gas system | Control mode | D07-7 k mass flowmeter, D08 flow display |
Flow specification (can be customized) | 0-500SCCM /0-1SLM, |
Linear | ±1%F.S. |
Accuracy | ±1%F.S. |
Repeated accuracy | ±0.2%F.S. |
Response time | ≤2sec |
Proof Pressure | 3MPa |
Gas path | 3 channels (according to customer requirements) |
Needle valve | 316 stainless steel |
Pipeline | Φ6mm stainless steel tube |
Connector | SwagelokΦ6mm |